Unaxis PECVD - UCLA Nanolab
The Unaxis 790 Series Plasma Enhanced Chemical Vapor Deposition (PECVD) system is used for the deposition of SiO2 & Silicon Nitride on Silicon and other wafers. The 790 Series systems are designed to provide plasma scientists with a flexible and cost effective platform for parallel plate processes.
ICP-PECVD (Unaxis VLR) - UCSB Nanofab Wiki - UC Santa Barbara
2023年5月23日 · Unaxis wafer coating procedure - process flow for achieving high-quality coatings. Important: This video is for reference only, and does not give you authorization to use the tool. You must be officially authorized by the supervisor before using this machine.
RIE combines plasma and ion beam removal of the surface of a substrate. The etching gas (as in plasma etch) enters the reactive chamber and is ionized by the application of an electric field such as RF. Individual gas molecules are accelerated to the substrate surface.
NanoFab Tool: Unaxis Shuttleline Inductively Coupled Plasma (ICP ...
2014年6月22日 · The Unaxis Shuttleline inductively coupled plasma (ICP) etcher is a general purpose chlorine reactive ion etcher. The high power ICP source combined with low vacuum operating pressure provides users with smooth anisotropic etch feature depths ranging from several micrometers to a few nanometers.
Unaxis wafer coating procedure - UCSB Nanofab Wiki - UC Santa …
See the ICP-PECVD Unaxis Recipes page for thin-film properties of each of the following recipes. We highly recommend using the Surfscan particle counter to monitor particle counts on look-ahead wafers prior to deposition.
Unaxis - The Perry Company
Unaxis is a leading global provider of manufacturing systems and services for the information technology industry. It manufactures semiconductors, data storage devices, flat panel displays and optical components.
Swiss-based Unaxis aims to be major player in chip gear, …
2000年7月13日 · But with Unaxis' planned majority stake in ESEC of Cham, Switzerland, the company will gain a strong foothold in large mature equipment segments serving worldwide semiconductor packaging plants.
Novalux allies with Unaxis to commercialize NECSEL light sources …
2006年6月14日 · NECSEL lasers overcome these obstacles, making them ideal light sources for next-generation devices. Ultimately, Novalux and Unaxis aim to enable low-cost NECSEL-based projection devices that exhibit unmatched picture brightness and contrast, true-to-life colors and long life operation.
Unaxis 770 Deep Silicon Etcher | CNF Users - Cornell University
A single chamber (licensed Bosch fluorine process) inductively coupled plasma / reactive ion etcher, the Unaxis SLR 770 etcher is used to etch deep patterns in single crystal silicon substrates. The resulting features are used for MEMS and biological applications.
NanoFab Tool: Reactive Ion Etcher Unaxis 790 Middle
2014年6月22日 · The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch polymer and dielectric materials. The large chamber can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.
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